In-Sensor Polarimetric Optoelectronic Computing Based on Gate-Tunable 2D ...
Multi-Color Detection of Single Sensor Based on Tellurium Relaxation Char...
Uncooled InAsSb- based high- speed mid- wave infrared barrier detector
High Frequency Mid-Infrared Quantum Cascade Laser Integrated With Grounde...
Multi-function sensing applications based on high Q-factor multi-Fano res...
High-power electrically pumped terahertz topological laser based on a sur...
Van der Waals polarity-engineered 3D integration of 2D complementary logic
Distinguishing the Charge Trapping Centers in CaF2-Based 2D Material MOSFETs
Influence of Growth Process on Suppression of Surface Morphological Defec...
High-Power External Spatial Beam Combining of 7-Channel Quantum Cascade L...
官方微信
友情链接

Deep Learning Strategies for Addressing Anomalous Exposure in Image Processing: The FARDBUNet Approach

2024-05-14


Zhou, Qi; Yang, Kai; Ke, Zunwang; Wang, Gang; Zhang, Yugui; Jia, Yizhen; Cao, Fengcai; Ma, Junxiao; Liu, Changlin; Zhang, Kaijie; Wu, Min Source: 2023 International Conference on High Performance Big Data and Intelligent Systems, HDIS 2023, p 39-46, 2023, 2023 International Conference on High Performance Big Data and Intelligent Systems, HDIS 2023;

Abstract:

In real-world scenarios, capturing scenes with excessive dynamic range often leads to the partial loss of highlight or dark area information due to irradiance variations and limitations in the capture capabilities of imaging devices caused by their size and material constraints. This phenomenon gives rise to anomalous exposure problems and triggers the loss of crucial initial details, thereby becoming a significant obstacle to achieving high image quality. Despite numerous researchers’ integration of exposure compensation techniques into the imaging process, the anomalous exposure problem remains unsolved, hindering progress in image processing. Consequently, considerable research is valuable in implementing exposure calibration techniques on visual perception and multimedia devices. This dissertation proposes FARDBUNet, a novel end-to-end exposure calibration model designed to address the anomalous exposure problem. A key innovation of FARDBUNet is the incorporation of a fused attention mechanism, enabling the model to prioritize regions needing enhanced correction while accounting for the global exposure characteristics of the image. Additionally, to tackle the challenge of inadequate information availability in the localized areas due to exposure issues, we introduce an atrous residual dense block that efficiently captures local information by expanding the receptive field. Comprehensive tests validate the effectiveness of our suggested model, which performs on par with leading techniques on expansive exposure datasets.

©2023 IEEE. (32 refs.)




关于我们
下载视频观看
联系方式
通信地址

北京市海淀区清华东路甲35号(林大北路中段) 北京912信箱 (100083)

电话

010-82304210/010-82305052(传真)

E-mail

semi@semi.ac.cn

交通地图
版权所有 中国科学院半导体研究所

备案号:京ICP备05085259-1号 京公网安备110402500052 中国科学院半导体所声明